发明名称 |
SOLUTIONS AND PROCESSES FOR REMOVING SUBSTANCES FROM SUBSTRATES |
摘要 |
The disclosure is directed solutions and processes to remove substances from substrates. Optionally, the substances can include photoresist on semiconductor wafers. The solution may include a quaternary ammonium hydroxide, a first amine, a second amine, and a third amine with the total amount of amine being no greater than about 95% by weight of a total weight of the solution. Additionally, a solution may include at least one amine, a quaternary ammonium hydroxide, and water and be free of a polar solvent other than water with the solution having a dynamic viscosity that is no greater than about 60 centipoise. |
申请公布号 |
WO2016118315(A1) |
申请公布日期 |
2016.07.28 |
申请号 |
WO2016US12107 |
申请日期 |
2016.01.05 |
申请人 |
DYNALOY, LLC |
发明人 |
ACRA, TRAVIS, W.;PETERS, RICHARD, DALTON;POLLARD, KIMBERLY, DONA;PFETTSCHER, DONALD, JAMES |
分类号 |
C11D7/32;B01F17/18;G03F7/42 |
主分类号 |
C11D7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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