ETCHING AGENT AND REPLENISHING SOLUTION THEREFOR, METHOD FOR ROUGHENING SURFACE OF MAGNESIUM COMPONENT, AND METHOD FOR MANUFACTURING MAGNESIUM-RESIN COMPOSITE

摘要

This etching agent is obtained from an aqueous solution containing at least one kind of acid selected from a group consisting of inorganic acids other than nitric acid and organic acids, as well as an organic nitrogen compound comprising N-OH or N-O- in the molecular structure. The concentration of acid in the etching agent is 0.05-3 weight% and the concentration of the organic nitrogen compound is 0.005-5 weight%. By bringing said etching agent into contact with the surface of a magnesium component, it is possible to form fine roughening patterns on the surface of the magnesium component even when etching depth is large.