发明名称 Process for preparing nanoparticle embedded electronic device
摘要 The present invention relates to a process for preparing an electronic device comprising at least one layer selected from the group consisting of a upper electrode layer, a lower electrode layer, an organic layer and an inorganic layer, which comprises a step of introducing a nanoparticle layer or a nano/micro structure layer by adhering charged nanoparticles, before, after or during forming the layer.
申请公布号 US9349976(B2) 申请公布日期 2016.05.24
申请号 US201314233813 申请日期 2013.03.04
申请人 SNU R&DB Foundation;Global Frontier Center for Multiscale Energy System 发明人 Kim Changsoon;Kim Hyungchae;Lee Jongcheon;Han Kyuhee;Sung Hyangki;Jung Kinam;Choi Hoseop;Ha Kyungyeon;Choi Man Soo
分类号 H01L51/50;H01L51/42;H01L21/326;H01L51/56;H01L51/00 主分类号 H01L51/50
代理机构 Dardi & Herbert, PLLC 代理人 Dardi & Herbert, PLLC ;Dardi Peter S.
主权项 1. A process for preparing an electronic device comprising at least one functional organic layer on a substrate, the process comprising: (1) locating the substrate with a first functional organic layer on an electrode in a reactor: (2) introducing a nanoparticle layer or a nano or micro structure layer by adhering charged nanoparticles in a form of aerosol onto the first functional organic layer by applying a voltage to the electrode while introducing the charged nanoparticles into the reactor; and (3) further forming a second organic layer or an inorganic layer over the first functional organic layer on which the charged nanoparticles are adhered so that the nanoparticle layer or a nano or micro structure layer is between the first functional organic layer and the second organic layer or the inorganic layer.
地址 Seoul KR
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