发明名称 |
Process for preparing nanoparticle embedded electronic device |
摘要 |
The present invention relates to a process for preparing an electronic device comprising at least one layer selected from the group consisting of a upper electrode layer, a lower electrode layer, an organic layer and an inorganic layer, which comprises a step of introducing a nanoparticle layer or a nano/micro structure layer by adhering charged nanoparticles, before, after or during forming the layer. |
申请公布号 |
US9349976(B2) |
申请公布日期 |
2016.05.24 |
申请号 |
US201314233813 |
申请日期 |
2013.03.04 |
申请人 |
SNU R&DB Foundation;Global Frontier Center for Multiscale Energy System |
发明人 |
Kim Changsoon;Kim Hyungchae;Lee Jongcheon;Han Kyuhee;Sung Hyangki;Jung Kinam;Choi Hoseop;Ha Kyungyeon;Choi Man Soo |
分类号 |
H01L51/50;H01L51/42;H01L21/326;H01L51/56;H01L51/00 |
主分类号 |
H01L51/50 |
代理机构 |
Dardi & Herbert, PLLC |
代理人 |
Dardi & Herbert, PLLC ;Dardi Peter S. |
主权项 |
1. A process for preparing an electronic device comprising at least one functional organic layer on a substrate, the process comprising:
(1) locating the substrate with a first functional organic layer on an electrode in a reactor: (2) introducing a nanoparticle layer or a nano or micro structure layer by adhering charged nanoparticles in a form of aerosol onto the first functional organic layer by applying a voltage to the electrode while introducing the charged nanoparticles into the reactor; and (3) further forming a second organic layer or an inorganic layer over the first functional organic layer on which the charged nanoparticles are adhered so that the nanoparticle layer or a nano or micro structure layer is between the first functional organic layer and the second organic layer or the inorganic layer. |
地址 |
Seoul KR |