发明名称 MATERIAL TREATMENT METHOD BY LASER ABLATION AND MATERIAL TREATED BY THE TREATMENT METHOD
摘要 In order to easily control the laser pulse width and perform high-precision processing, the method for processing a material by laser ablation according to the present invention is characterized in that the material having a region of which a double logarithmic chart shows a linearly-shaped line with a gradient of not more than 0.5, when a relationship between laser pulse width and ablation threshold is represented in the logarithmic chart with a laser pulse width in picosecond plotted along the horizontal axis and an ablation threshold in J/cm 2 plotted along the vertical axis, is processed by the pulsed laser beam having the laser pulse width within the region.
申请公布号 EP1859894(A1) 申请公布日期 2007.11.28
申请号 EP20060714424 申请日期 2006.02.23
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 MISHIMA, HIDEHIKO;MASUDA, YASUHITO;OKUDA, YASUHIRO;WATATANI, KENICHI;SAKABE, SHUJI;HASHIDA, MASAKI;SHIMIZU, SEIJI
分类号 B23K26/40 主分类号 B23K26/40
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