发明名称 |
SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER |
摘要 |
A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer. |
申请公布号 |
US2016170314(A1) |
申请公布日期 |
2016.06.16 |
申请号 |
US201615014829 |
申请日期 |
2016.02.03 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LAFARRE Raymond Wilhelmus Louis;TEN KATE Nicolaas;DZIOMKINA Nina Vladimirovna;KARADE Yogesh Pramod;TROMP Siegfried Alexander;LEIJSSEN Jacobus Josephus;RODENBURG Elisabeth Corinne;FEIJTS Maurice Wilhelmus Leonardus Hendricus;HUISMAN Hendrik |
分类号 |
G03F7/20;B05D3/02 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
Veldhoven NL |