| 摘要 |
A method for fabricating a plasma display panel is provided to improve a fabrication yield of the plasma display panel by reducing a loss of barrier in a sandblasting process. A barrier layer(101) is formed by coating barrier material on a PDP substrate. A resist film(102) is formed on the barrier layer by laminating a dry film resist using a heating roller. A glass substrate is exposed to the resist film by using a photo mask(103) on which a circuit pattern is formed. And a non-exposure region is removed on the resist film by using a developing process so that the resist film is remained on the barrier layer. After forming a pattern of the resist film, a barrier pattern is formed by a sandblasting process. The pattern of the resist film prevents the barrier material from cutting in the sandblasting process. After exposing and developing processes for forming the pattern of the resist film, an ultraviolet post curing process is performed before sandblasting the barrier layer. The barrier pattern in formed on the substrate and the resist film is peeled by using peeling liquid.
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