发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 An exposure device includes a rotation driving section that rotationally drives an exposure object; a light irradiation section that irradiates an exposure surface of the exposure object with laser light; a slide moving section secured to the rotation driving section or the light irradiation section, and moving the rotation driving section or the light irradiation section along the exposure surface in a direction crossing a direction of rotation of the rotation driving section; a signal generating section that transmits an analog modulating signal to the light irradiation section in accordance with a rotation synchronization signal from the rotation driving section, the analog modulating signal causing an intensity of the laser light to be changed; and a controlling section that controls movements of the rotation driving section, the slide moving section, and the light irradiation section.
申请公布号 US2016216614(A1) 申请公布日期 2016.07.28
申请号 US201615091005 申请日期 2016.04.05
申请人 SONY CORPORATION 发明人 HAGA Shinsuke;OHNO Masaki;TAKEUCHI Taichi
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. A film manufacturing method comprising: forming a roll die used in roll imprint; and transferring a pattern on the roll die to a film substrate, wherein the forming the roll die comprises:rotating an exposure object and generating a rotational synchronization signal;causing a laser light to scan along an exposure surface of the rotating exposure object in a direction crossing a direction of rotation of the exposure object, the exposure surface being irradiated with the laser light; andmodulating an intensity of the laser light in accordance with the rotational synchronization signal, wherein the intensity of the laser light is modulated in accordance with a rotation period of the exposure object,wherein the intensity of the laser light with which the exposure object is irradiated in a same rotation phase of the exposure object is changed with time, andwherein the minimum value of the intensity of the laser light is lower than a threshold value of an amount of the laser light received for causing a reaction that makes the exposure object soluble in a developer; andforming grooves separated from each other on the exposure object.
地址 Tokyo JP