METHODS OF FORMING PATTERNS

摘要

Methods of forming patterns includes guide patterns on a neutral layer. A self-assembling block copolymer (BCP) layer on the guide patterns and the neutral layer. By annealing the self-assembling BCP layer, first polymer block domains and second polymer block domains are formed The guide patterns are formed of a developable antireflective material. The neutral layer is formed of a cross-linked polymeric material.

主权项

1. A method of forming patterns, the method comprising:
forming a neutral layer on an underlying layer; forming a developable antireflective layer on the neutral layer; forming a photoresist layer on the developable antireflective layer; selectively exposing portions of the photoresist layer and portions of the developable antireflective layer to light; selectively removing, non-exposed portions of the photoresist layer to form a photoresist pattern exposing non-exposed portions of the developable antireflective layer; selectively removing the exposed portions of the developable antireflective layer to form guide patterns exposing portions of the neutral layer; forming a self-assembling block copolymer (BCP) layer on the guide patterns and the exposed neutral layer; and annealing the self-assembling BCP layer to form first polymer block domains and second polymer block domains, which are alternately and repeatedly arrayed.