发明名称 |
Anode used for electroplating |
摘要 |
The present invention relates to an anode for electroplating, which has an anode base and a shield and is characterized in that additive degradation is reduced when it is used in electroplating.
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申请公布号 |
US2006124454(A1) |
申请公布日期 |
2006.06.15 |
申请号 |
US20030540232 |
申请日期 |
2003.12.23 |
申请人 |
MPC MICROPULSE PLATING CONCEPTS |
发明人 |
WURM JORG;MENARD STEPHANE |
分类号 |
B23H3/04;C25D17/10;C25D17/12 |
主分类号 |
B23H3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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