发明名称 PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SILICA SOL AND CURED PRODUCT USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in transparency, light resistance, weather resistance, heat resistance, flatness, surface hardness, adhesion, chemical resistance, and the like.SOLUTION: The photosensitive resin composition contains, as essential components: (i) an alkali-soluble resin which is represented by general formula (1) and has a carboxyl group and a polymerizable double bond in one molecule; (ii) a polymerizable compound having at least one polymerizable double bond; (iii) a silica sol which has been treated with a surface treating agent represented by general formula (3) and has an average particle diameter of 10-300 nm; (iv) a photopolymerization initiator; and (v) a silane coupling agent.
申请公布号 JP2014002374(A) 申请公布日期 2014.01.09
申请号 JP20130108890 申请日期 2013.05.23
申请人 NIPPON STEEL & SUMIKIN CHEMICAL CO LTD 发明人 NAMEKAWA TAKAHIRA;YAMADA HIROAKI;SHIROYAMA TAKASHI
分类号 G03F7/032;C07C69/76;C08F290/00;G03F7/075 主分类号 G03F7/032
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