发明名称 |
GRAPHENE NANORIBBON PRECURSORS AND MONOMERS SUITABLE FOR PREPARATION THEREOF |
摘要 |
Provided are graphene nanoribbon precursors comprising repeated units of the general formula (I) in which R1, R2 are each H, halogen, —OH, —NH2, —CN, —NO2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH2, —CN, and/or —NO2, where one or more CH2 groups may also be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR—, in which R is an optionally substituted C1C40-hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical.; |
申请公布号 |
US2016333141(A1) |
申请公布日期 |
2016.11.17 |
申请号 |
US201615219747 |
申请日期 |
2016.07.26 |
申请人 |
BASF SE ;Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V. |
发明人 |
SCHWAB Matthias Georg;MUELLEN Klaus;FENG Xinliang;DOESSEL Lukas |
分类号 |
C08G61/10;H01L51/10;H01L51/00;C07C25/18;C07C15/14 |
主分类号 |
C08G61/10 |
代理机构 |
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代理人 |
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主权项 |
1. A graphene nanoribbon obtained by cyclodehydrogenation, in solution or on a metal surfgace, of a precursor comprising repeat units of the general formula (I) in which R1, R2 are each H, halogen, —OH, —NH2, —CN, —NO2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH2, —CN, and/or —NO2, where one or more CH2 groups may also be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR—, in which R is an optionally substituted C1C40-hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical. |
地址 |
Ludwigshafen DE |