发明名称 GRAPHENE NANORIBBON PRECURSORS AND MONOMERS SUITABLE FOR PREPARATION THEREOF
摘要 Provided are graphene nanoribbon precursors comprising repeated units of the general formula (I) in which R1, R2 are each H, halogen, —OH, —NH2, —CN, —NO2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH2, —CN, and/or —NO2, where one or more CH2 groups may also be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR—, in which R is an optionally substituted C1C40-hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical.;
申请公布号 US2016333141(A1) 申请公布日期 2016.11.17
申请号 US201615219747 申请日期 2016.07.26
申请人 BASF SE ;Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V. 发明人 SCHWAB Matthias Georg;MUELLEN Klaus;FENG Xinliang;DOESSEL Lukas
分类号 C08G61/10;H01L51/10;H01L51/00;C07C25/18;C07C15/14 主分类号 C08G61/10
代理机构 代理人
主权项 1. A graphene nanoribbon obtained by cyclodehydrogenation, in solution or on a metal surfgace, of a precursor comprising repeat units of the general formula (I) in which R1, R2 are each H, halogen, —OH, —NH2, —CN, —NO2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH2, —CN, and/or —NO2, where one or more CH2 groups may also be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR—, in which R is an optionally substituted C1C40-hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical.
地址 Ludwigshafen DE