| 发明名称 |
Determination of lithography tool process condition |
| 摘要 |
A method for forming an integrated circuit (IC) is presented. The method includes providing a wafer having a substrate prepared with a photoresist layer. The photoresist layer is processed by passing a radiation from an exposure source of a lithography tool through a mask having a pattern. The process parameters of the lithography tool are determined by performing a pattern matching process. The photoresist layer is developed to transfer the pattern on the mask to the photoresist layer. |
| 申请公布号 |
US8741511(B1) |
申请公布日期 |
2014.06.03 |
| 申请号 |
US201213720879 |
申请日期 |
2012.12.19 |
| 申请人 |
GLOBALFOUNDRIES Singapore Pte. Ltd. |
发明人 |
Zhou Wenzhan;Lin Qun Ying |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for forming an integrated circuit (IC) comprising:
providing a wafer having a substrate prepared with a photoresist layer; processing the photoresist layer by passing a radiation from an exposure source of a lithography tool through a mask having a pattern, wherein process parameters of the lithography tool which is used to process the photoresist layer is determined by performing a pattern matching process; and developing the photoresist layer to transfer the pattern on the mask to the photoresist layer.
|
| 地址 |
Singapore SG |
