发明名称 |
METHOD OF MANUFACTURING DESIGN DEFECTIVE MASK |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a design defective mask capable of manufacturing a fine design defective part faithfully and stably.SOLUTION: A method of manufacturing a design defective mask having a design defective part formed intentionally used in an appearance inspection device of a mask for NIL includes a step for forming a first mask having a white defective part by performing etching on a salient of a basic pattern by using a correction device, and a step for forming a second mask having a black defective part where the white defective part is transferred by imprint using the first mask. The manufacturing method is characterized in that the black defective part is the design defective part. |
申请公布号 |
JP2014110407(A) |
申请公布日期 |
2014.06.12 |
申请号 |
JP20120265661 |
申请日期 |
2012.12.04 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
NISHIGUCHI TAKAO;SASAKI SHIHO;HIROTA REIJI;YOSHIKAWA SHINGO |
分类号 |
H01L21/027;B29C33/38 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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