发明名称 METHOD OF MANUFACTURING DESIGN DEFECTIVE MASK
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a design defective mask capable of manufacturing a fine design defective part faithfully and stably.SOLUTION: A method of manufacturing a design defective mask having a design defective part formed intentionally used in an appearance inspection device of a mask for NIL includes a step for forming a first mask having a white defective part by performing etching on a salient of a basic pattern by using a correction device, and a step for forming a second mask having a black defective part where the white defective part is transferred by imprint using the first mask. The manufacturing method is characterized in that the black defective part is the design defective part.
申请公布号 JP2014110407(A) 申请公布日期 2014.06.12
申请号 JP20120265661 申请日期 2012.12.04
申请人 DAINIPPON PRINTING CO LTD 发明人 NISHIGUCHI TAKAO;SASAKI SHIHO;HIROTA REIJI;YOSHIKAWA SHINGO
分类号 H01L21/027;B29C33/38 主分类号 H01L21/027
代理机构 代理人
主权项
地址