发明名称 MEASUREMENT DEVICE, LITHOGRAPHY SYSTEM AND EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
摘要 A measurement device (100) according to the present invention is provided with a surface plate (12), a slider (10) which holds a substrate (W) and which is movable relative to the surface plate, a drive system that drives the slider, a first position measurement system which measures first position information on the slider relative to the surface plate, a measurement unit (40) provided with a marking detection system (MDS) that detects any markings on the substrate, a second position measurement system that measures relative second position information on the marking detection system and the surface plate, and a control device which obtains the first position information from the first position measurement system and the second position information from the second position measurement system while controlling the driving of the slider by the drive system, and which obtains position information on a plurality of markings on the basis of a detection signal from the marking detection system having detected markings on the substrate, the first position information, and the second position information.
申请公布号 WO2016136689(A1) 申请公布日期 2016.09.01
申请号 WO2016JP55131 申请日期 2016.02.23
申请人 NIKON CORPORATION 发明人 SHIBAZAKI, Yuichi
分类号 G01B11/00;G03F9/00;H01L21/027 主分类号 G01B11/00
代理机构 代理人
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