Poly(hydroxystyrene) stain resist

摘要

A composition for use as a stain blocker and a method of treating substrates therewith, said composition comprising a polymer of Formula 1 having the following repeating units in random sequence wherein R¹ is H, methyl or ethyl; R² and R³ are each independently H, C₁ to about C₁₀ alkyl, -COOR⁴, CONR⁵R⁶, or -CN; R⁴ is M, C₁ to about C₂₀ alkyl, or C₆ to C₁₀ aryl; R⁵ and R⁶ are each independently H, C₁ to C₁₀ alkyl, C₆ to C₁₀ aryl, or R⁵ and R⁶ together with the nitrogen atom form a morpholine, pyrrolidine, or piperidine ring; R⁷ is a C₄ to C₈ alkyl group; M is H, an alkali metal or alkali earth metal; h is about 10 to 100 mole %; i is 0 to about 80 mole %; j is 0 to about 60 mole %; k and n are each independently 0 to about 40 mole %; and m is 0.01 to about 0.5; provided that h+i+j+k+n equals 100, and provided that i+j+k+n is greater than zero, except when h is 100%.