| 摘要 |
PROBLEM TO BE SOLVED: To set parameters efficiently that is used in a lithography process.SOLUTION: A master server 6 for managing exposure devices EXA, EXB includes a parameter selection unit 62 for selecting common parameters that can be set commonly, out of first set and second set parameters used, respectively, by the exposure devices EXA, EXB in a lithography process, a first parameter determination unit 63 for determining the values of the first set parameters and setting in the exposure device EXA, and a second parameter determination unit 64 for setting the values of common parameters out of the first set parameters in the exposure device EXB.SELECTED DRAWING: Figure 3 |
