发明名称 METHOD FOR PRODUCTION OF SILICON SINGLE CRYSTAL, APPARATUS FOR CONTROLLING PRODUCTION OF SILICON SINGLE CRYSTAL, AND PROGRAM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a silicon single crystal-producing method which enables production of a grown crystal having a resistivity distribution equivalent to that of the single crystal product obtained by a conventional FZ method even when a silicon crystal having been pulled by a CZ method is used. <P>SOLUTION: In the silicon single crystal-producing method using an FZ method, a P-type or N-type silicon crystal pulled by a CZ method is used as a raw material 6, and while supplying an impurity having the same conductivity type as that of the raw material 6 by a gas doping apparatus 4, the material is recrystallized by an induction heating coil 3 to prepare a single crystal product 8. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008087984(A) 申请公布日期 2008.04.17
申请号 JP20060267287 申请日期 2006.09.29
申请人 SUMCO TECHXIV CORP 发明人 SOGO SHINJI;SATO TOSHIYUKI
分类号 C30B29/06;C30B13/12 主分类号 C30B29/06
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