发明名称 VACUUM TREATMENT METHOD AND VACUUM TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To suitably subject a work to target treatment by suppressing development of an arcing phenomenon. SOLUTION: A vacuum vessel 1 is evacuated in a state that a work piece W is arranged in a holder 2. A heating gas is fed to the vessel 1 and the gas is heated to form a heating gas atmosphere in the vessel 1. The work piece W is heated in the heating gas atmosphere and the vessel 1 is evacuated to eliminate an arcing development promoting substance from the work piece W. Thus, the arcing development promoting substance is discharged from the vessel 1 with the heating gas. Subsequently, the work piece W is subjected to the target treatment (for example, film formation treatment). COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009001898(A) 申请公布日期 2009.01.08
申请号 JP20080125793 申请日期 2008.05.13
申请人 NISSIN ELECTRIC CO LTD 发明人 MIKAMI TAKASHI
分类号 C23C14/02;C23C14/06;C23C14/32 主分类号 C23C14/02
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