| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for forming a resist underlay film.SOLUTION: A composition for forming a resist underlay film comprises a compound represented by formula (0) below. In the formula, R represents an alkyl group, a silyl group or a haloalkyl group, or a phenyl group, a naphthyl group or an anthryl group which may be substituted with at least one of an alkyl group, a haloalkyl group and a halogeno group; X represents an alkyl group which may be substituted with a halogeno group, a vinyl group, an allyl group, a hydroxy group, a carboxyl group, an amino group, an alkylthio group, a cyano group, an acetyl group, an acetyloxy group, an alkoxy carbonyl group, a nitro group, a nitroso group, an amide group, an imide group, an alkoxysulfonyl group or a sulfonamide group, or a phenyl group, a naphthyl group, an anthryl group or a pyrenyl group which may be substituted with at least one of an alkyl group, a haloalkyl group and a halogeno group; and p represents 2 or 3.SELECTED DRAWING: None |
