| 发明名称 |
Polishing pad and method of producing the same |
| 摘要 |
The present invention mainly relates to a polishing pad and method of producing the same. The polishing pad comprises a base material having a surface for polishing a substrate, wherein the surface comprises a non-woven fabric and an elastomer. The non-woven fabric is made of a long fiber and the elastomer is embedded into the fabric.
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| 申请公布号 |
US2008171493(A1) |
申请公布日期 |
2008.07.17 |
| 申请号 |
US20070652595 |
申请日期 |
2007.01.12 |
| 申请人 |
SAN FANG CHEMICAL INDUSTRY CO., LTD. |
发明人 |
FENG CHUNG-CHIH;YAO I-PENG;CHAO CHEN-HSIANG;HUNG YUNG-CHANG |
| 分类号 |
B24D99/00;D06C3/00;B24B1/00;D04H13/00 |
主分类号 |
B24D99/00 |
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