| 摘要 |
A method for producing a blank from titanium-doped, highly silicic-acidic glass having a specified fluorine content for use in EUV lithography is described, in which the thermal expansion coefficient over the operating temperature remains at zero as stably as possible. The course of the thermal expansion coefficient of Ti-doped silica glass depends on a plurality of influencing factors. In addition to the absolute titanium content, the distribution of the titanium is of significant importance, as is the ratio and distribution of additional doping elements, such as fluorine. In the method, fluorine-doped TiO2—SiO2 soot particles are generated and processed further via consolidation and vitrifying into the blank, and, by flame hydrolysis of input substances containing silicon and titanium, TiO2—SiO2-soot particles are formed, exposed to a reagent containing fluorine in a moving powder bed, and converted to the fluorine-doped TiO2—SiO2-soot particles. |
