Modified antistatic compositions and thermally developable materials containing same

摘要

Antistatic compositions include a fluorochemical that is a reaction product of Rf-CH2CH2-SO3H with an amine wherein Rf comprises 4 or more fully fluorinated carbon atoms. These antistatic compositions can be formulated in organic solvent-based conductive coating compositions, with or without hydrophobic binders, that can be used to form conductive layers in thermally developable materials including thermographic and photothermographic materials.