发明名称 |
PHOTOMASK AND PATTERN FORMATION METHOD USING THE SAME |
摘要 |
A photomask includes a transparent substrate having a transparent property against exposing light and a halftone portion formed on the transparent substrate. In the halftone portion, a first opening having a first dimension and a second opening having a second dimension larger than the first dimension are formed. A light-shielding portion is formed on the transparent substrate to be disposed around the second opening.
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申请公布号 |
US2009061328(A1) |
申请公布日期 |
2009.03.05 |
申请号 |
US20080181650 |
申请日期 |
2008.07.29 |
申请人 |
NONAMI YUJI;MISAKA AKIO;IRIE SHIGEO |
发明人 |
NONAMI YUJI;MISAKA AKIO;IRIE SHIGEO |
分类号 |
G03F1/32;G03F1/68;G03F7/22 |
主分类号 |
G03F1/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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