发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a transistor with high field-effect mobility, a transistor having stable electrical characteristics, a transistor having a low off-state current, or a semiconductor device including the transistor.SOLUTION: A semiconductor device includes a first conductor, a first insulator over the first conductor, a first semiconductor over the first insulator, a second semiconductor over the first semiconductor, a second conductor and a third conductor over the second semiconductor, a third semiconductor over the second semiconductor, the second conductor, and the third conductor, a second insulator over the third semiconductor, and a fourth conductor over the second insulator. In a method for manufacturing the semiconductor device, formation of each layer is performed without exposure to the air.
申请公布号 JP2015188084(A) 申请公布日期 2015.10.29
申请号 JP20150050523 申请日期 2015.03.13
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;SAKAKURA MASAYUKI;HAMADA TAKASHI
分类号 H01L21/336;H01L21/8242;H01L27/108;H01L29/786 主分类号 H01L21/336
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