发明名称 CHARGED PARTICLE BEAM APPARATUS AND PROBE CONTROL METHOD
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus in micromanipulation and a probe control technique using an image analyzer. SOLUTION: A probe controller 4 applies a voltage to a probe, to enhance the contrast between a probe and the surface of a sample 3 so that effect of a sample surface image is removed from a secondary particle image of a charged particle ray device. Then, the position of the probe is detected by image analysis of an image under observation, to guide a probe 11 to a desired position.
申请公布号 JP2001324459(A) 申请公布日期 2001.11.22
申请号 JP20000148583 申请日期 2000.05.16
申请人 HITACHI LTD 发明人 FUKUDA MUNEYUKI;TOMIMATSU SATOSHI;SHICHI HIROYASU
分类号 G01N23/225;G21K5/00;G21K5/04;H01J37/20;H01J37/22;H01J37/30;H01L21/66;(IPC1-7):G01N23/225 主分类号 G01N23/225
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