发明名称 METHOD AND APPARATUS FOR MEASURING NEGATIVE ION DENSITY
摘要 <P>PROBLEM TO BE SOLVED: To provide a convenient and precise method and a compact apparatus at a low cost, which measure density of negative ions in plasma. <P>SOLUTION: The apparatus is provided with a discharge plasma device and a negative ion measuring device, and a probe 4 which is a micrometal electrode is inserted into the plasma 3 generated in a plasma container 2 by discharge of a power source 1 for developing the plasma, thereby forming a sheath region around the probe 4. When the probe 4 is biased positively by using a power source 5 for biasing the probe 4 so that the probe potential Vp is higher than the plasma potential Vs, electrons and the negative ions having negative charges are accelerated and collide with the probe 4, and current flows, and a spatter phenomenon arises. A quantity of spatter &Delta;M is measured by a measuring tool 6, and an inlet flow value Q of the negative ions into the probe is determined from the shape (surface area) of the sheath and the negative ion density n<SB>n</SB>. A relational expression between values Q and n<SB>n</SB>is derived theoretically, and the negative ion density n<SB>n</SB>can be finally determined from measurement results of &Delta;M. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005049143(A) 申请公布日期 2005.02.24
申请号 JP20030204053 申请日期 2003.07.30
申请人 JAPAN SCIENCE & TECHNOLOGY AGENCY 发明人 SUGAI HIDEO;EUGEN STAMATE;OE KAZUYUKI;TAKAI OSAMU
分类号 G01N27/60 主分类号 G01N27/60
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