| 摘要 |
Provided is a photoresist resin composition having excellent sensitivity and resolution and high film retention, as well as other properties that are at least commensurate with those of the commonly used compositions. The photoresist resin composition contains a high-ortho-novolac phenol resin, a naphthoquinone diazide derivative, and a solvent, the high-ortho-novolac phenol resin being obtained by reacting an aldehyde and one or two compounds selected from meta-cresol, para-cresol, 3,5-xylenol, and 2,3,5-trimethylphenol in the presence of an acid catalyst at a temperature of 110-220°C. |
