发明名称 |
SUBSTRATE PROCESSING EQUIPMENT |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide substrate processing equipment in which the flow rate of processing liquid delivered to a substrate can be measured accurately, and the substrate can be processed appropriately. <P>SOLUTION: First chemical is delivered from a delivery nozzle toward a container (step T2). A predetermined quantity of first chemical is stored in the container (Yes at step T3) and the time required for storing that first chemical is measured (step T4) and then actual flow rate of the first chemical delivered from the delivery nozzle into the container is operated based on them (step T6). Based on the actual flow rate and the measurements outputted from the flowmeter when the first chemical is delivered, a correction factor corresponding to the first chemical is operated (step T7). Measurements outputted from the flowmeter are corrected by this correction factor. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
申请公布号 |
JP2008098426(A) |
申请公布日期 |
2008.04.24 |
申请号 |
JP20060278800 |
申请日期 |
2006.10.12 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
EDAMOTO NOBUO;YONEZAWA TORU |
分类号 |
H01L21/304;G03F1/82;H01L21/306 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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