发明名称 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <p>An illumination optical system, an exposure apparatus, and a device manufacturing method are provided to control continuously the amount of light without increasing complexity of a hardware structure. An illumination optical system illuminates a target surface by using light irradiated from a light source. An iris(25) is arranged on a pupil plane of the illumination optical system. The iris has a constant area. An irradiation range control unit controls an irradiation range of the light at the pupil plane. The irradiation range of the light includes an opening. The irradiation range control unit changes the irradiation range in order to control the amount of light at an illuminating target. The irradiation range control unit includes a zoom optic system(28).</p>
申请公布号 KR20080066595(A) 申请公布日期 2008.07.16
申请号 KR20080003241 申请日期 2008.01.11
申请人 CANON KABUSHIKI KAISHA 发明人 KAWASAKI TAKAFUMI
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址
您可能感兴趣的专利