发明名称 WIRING STRUCTURE AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To suppress contact of the contact surface, to be connected with a through electrode, with a conductive region other than the through electrode, without requiring any additional cost and without impeding compaction of a chip.SOLUTION: A wiring structure includes a first through hole 102 formed to penetrate a substrate 101, and a counterbore part 103 formed in a first surface 101a of the substrate 101 around the first through hole 102, with an area wider than the first through hole 102. The wiring structure further includes a first insulation layer 104 formed on the inner sidewall of the first through hole 102, and a second insulation layer 105 formed by filling the counterbore part 103 continuously to the first insulation layer 104. A through electrode 107 penetrating the substrate 101 is also provided in a second through hole 106 surrounded by the first insulation layer 104 in the first through hole 102.SELECTED DRAWING: Figure 1
申请公布号 JP2016213225(A) 申请公布日期 2016.12.15
申请号 JP20150092625 申请日期 2015.04.30
申请人 AZBIL CORP 发明人 ZUSHI NOBUHIKO
分类号 H01L21/3205;G01L9/00;H01L21/768;H01L23/14;H01L23/522;H01L29/84 主分类号 H01L21/3205
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