Systems and methods for buffer gas flow stabilization in a laser produced plasma light source

摘要

An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.

主权项

1. An extreme-ultraviolet (EUV) light source comprising;
an optic; a target material; an EUV mirror having an aperture; a laser beam passing through said optic along a beam path to irradiate said target material, wherein said optic represents focusing optic to define a focal spot of said laser beam along said beam path; and a system generating a gas flow directed through said aperture toward said target material along said beam path, said as flow being substantially turbulent-free, said system having a tapering member surrounding a volume and a plurality of gas lines, said tapering member having a small end disposed toward said aperture and a large end disposed opposite said small end to produce substantially turbulent-free flow in a portion of said volume toward said aperture, wherein at least said portion of said volume is disposed between said EUV mirror and said optic, said optic is disposed along said beam path between said large end and said small end within said volume and each gas line of said plurality of gas lines input a gas into said volume from said large end of said tapering member.