| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of inspecting a defect of a periodic pattern which enables the inspection of the periodic pattern of a fine pitch like a photomask for a memory with high precision, and to provide a device for inspecting the defect. <P>SOLUTION: The periodic pattern on a substrate is irradiated with the light with an inherent wavelength from a light source to measure the angle of diffraction of the principal peak of the diffracted light and the pitch dimension of the periodic pattern is calculated from the measured angle of diffraction or the pitch dimension of the periodic pattern is acquired from the screen data of the periodic pattern. The angle of incidence to the periodic pattern of the light emitted from the light source is calculated so as to take the contrast of the intensities of the diffracted light of the normal pattern and irregular part of the periodic pattern from the obtained pitch dimension and a wavelength for calculating the angle of diffraction predetermined with respect to the wavelength of the light source used in inspection. The light source and the substrate are relatively aligned with each other so that light can enter the periodic pattern at the angle of incidence from the light source, and the periodic pattern is irradiated with the light with the wavelength of the light source to be inspected. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
