发明名称 Lithographic apparatus and device manufacturing method
摘要 To improve the resolution of lithographic apparatus, a flexible member is provided between the projection system and the substrate. The flexible member may be filled with a fluid of a known refractive index. The flexible member may be in contact with both the projection system and the substrate.
申请公布号 US2006285097(A1) 申请公布日期 2006.12.21
申请号 US20060496715 申请日期 2006.08.01
申请人 ASML NETHERLANDS B.V. 发明人 HUBERTUS MULKENS JOHANNES C.;BENSCHOP JOZEF P.H.
分类号 G03B27/42;G03F7/20 主分类号 G03B27/42
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