发明名称 LAMINATE FOR RETORT
摘要 PROBLEM TO BE SOLVED: To provide a transparent gas barrier laminate for a retort not deteriorated in its properties even at the time of sterilization treatment such as retorting treatment or the like by increasing the adhesion of a vapor deposition film and relaxing the retorting impact to the vapor deposition film. SOLUTION: This laminate for the retort is obtained by coating a plastic base material 1 with a resin undercoating layer containing 5-60 wt.% of an inorganic filler and further providing an inorganic vapor deposition layer 3 with a thickness of 5-100 nm on the resin undercoating layer. By this constitution, the gas barrier properties of the laminate are not damaged even by heat treatment (retorting treatment) due to high temperature and high pressure water [the laminate is held to 121°C for 30 min under a pressure of 2.45×10<SP>5</SP>Pa (gauge pressure)]. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006224427(A) 申请公布日期 2006.08.31
申请号 JP20050040223 申请日期 2005.02.17
申请人 TOPPAN PRINTING CO LTD 发明人 SUZUKI HIROSHI;FUKUGAMI YOSHISUE
分类号 B32B9/00;B65D65/42;C23C14/08 主分类号 B32B9/00
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