| 摘要 |
The present invention relates to an etching method for etching a film to form a concave portion therein with the use of a photoresist mask provided with an opening. In this method, there is determined, in advance, a first correlation between a parameter value and an opening dimension of the concave portion, as a process parameter for the etching process, when the etching process is conducted with the use of the mask provided with the opening of a reference opening dimension. In addition, there is determined, in advance, a second correlation between a variation in opening dimension of the mask and a variation in opening dimension of the concave portion. When conducting the etching process, an actual opening dimension of the mask is measured. A target parameter value of the process parameter for achieving a target opening dimension of the concave portion is determined, based on a difference between the actual opening dimension of the mask and the reference opening dimension thereof, the target opening dimension of the concave portion to be formed, and the first and second correlations.
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