| 摘要 |
A method for generating a photoresist pattern (101, 102) on top of an object (7, 9) that includes a layer of material that is opaque to light of a predetermined wavelength. The object (7, 9) is first covered with a layer of photoresist material (10). The layer of photoresist material (10) is then irradiated with light of the predetermined wavelength from a position under the object (7, 9) such that the object (7, 9) casts a shadow into the layer of photoresist (10). The photoresist material is then developed to generate the photoresist pattern (101, 102). The step of irradiating the layer of photoresist material (10) from below the object (7, 9) can be accomplished by providing a reflecting surface (41) below the object (7, 9) and a light source above the object (7, 9). A mask (42) is positioned between the object (7, 9) and the light source such that the mask (42) casts a shadow that covers the object (7, 9) and a portion of the area surrounding the object (7, 9). The method of the present invention is well suited for depositing a layer of dielectric material over a device in which the dielectric layer has a via therethrough terminating on a metallic pad (7, 9) that is part of the device. |
