HIGH-FREQUENCY POWER SUPPLY DEVICE, AND PLASMA IGNITION METHOD

摘要

A high-frequency power supply device is provided with a plasma ignition step that supplies pulse power to ignite plasma, and drive power supply step to supply drive power for maintaining the plasma being generated. In the plasma ignition step, an ignition pulse being applied in an ignition pulse output operation is configured as including a main pulse that induces ignition, and a prepulse with lower power than the power of the main pulse and being applied at a stage prior to the main pulse. Since the ignition pulse is configured as including the main pulse and the prepulse, this enables protection of a high-frequency power source against reflected wave power, as well as reliably igniting the plasma.

主权项

1. A plasma ignition method of a high-frequency power supply device, the method igniting plasma by applying high-frequency power from the high-frequency power supply device, comprising,
a plasma ignition step that ignites the plasma by a pulse output delivered on an intermittent time base, and a plasma drive power supply step that supplies drive power to maintain the plasma being ignited, after the plasma is ignited by the plasma ignition step, wherein, the plasma ignition step includes an ignition pulse output operation that outputs an ignition pulse to ignite the plasma, the ignition pulse includes an optional number of prepulses and a main pulse, each of the prepulses having power lower than the power of the main pulse and delivered at a stage prior to the main pulse, and the main pulse being delivered initially after the prepulses, and after the plasma is ignited by the plasma ignition step, the plasma ignition step is shifted to the plasma drive power supply step that supplies drive power to maintain the plasma being ignited.