| 发明名称 |
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS |
| 摘要 |
A monomer having a plurality of tertiary alcoholic hydroxyl groups is provided. A useful polymer is obtained by polymerizing the monomer. From a resist composition comprising the polymer, a negative pattern which is insoluble in alkaline developer and has high etch resistance is formed at a high resolution. |
| 申请公布号 |
EP3035121(A3) |
申请公布日期 |
2016.07.20 |
| 申请号 |
EP20150200064 |
申请日期 |
2015.12.15 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
SAGEHASHI, MASAYOSHI;HASEGAWA, KOJI;KATAYAMA, KAZUHIRO;HATAKEYAMA, JUN |
| 分类号 |
G03F7/004;C08F220/20 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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