| 摘要 |
To provide an acrylamide derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition, a polymer produced through polymerization of a raw material containing the acrylamide derivative, and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. The invention provides an acrylamide derivative represented by the following formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents a C1 to C10 alkylene group or a C3 to C10 cycloalkylene group; R2 represents a cyclic group having 3 to 20 ring-forming atoms and represented by the following formula (2): wherein X represents an oxygen atom or >N-R3; R3 represents a hydrogen atom or a C1 to C5 alkyl group; Y represents >C=O or >S(=O)n; and n is an integer of 0 to 2. |
