Apparatus and method for vapor generation and film deposition

摘要

An apparatus and method for generating a vapor with a compact vaporizer design and exposing the gas and liquid mixture for vaporization to a reduced maximum temperature. A gas and liquid droplet flow through a metal housing configured to heat the gas and liquid droplet mixture flow for vaporization includes directing the gas and liquid droplet mixture through an inlet of the metal housing and flowing the gas through a tortious flow path defined by a plurality of tubular flow passageways arranged around a central axis for vaporization. Residual liquid droplets may be further vaporized by flowing through a second metal housing configured to heat the gas and liquid droplet mixture for vaporization and having a similar construction to the first metal housing and providing a second tortious flow path.

主权项

1. An apparatus for vaporizing a liquid to form a vapor, the apparatus comprising:
a housing: a primary heat exchanger within the housing and having an inlet for a gas carrying suspended liquid droplets to enter and an outlet for a gas/vapor mixture to flow out of the primary heat exchanger, the primary heat exchanger comprising a multitude of tubular flow passageways configured to heat the gas and vaporize liquid droplets in the gas to produce a gas and vapor mixture; and a secondary heat exchanger within the housing and in fluid communication with the primary heat exchanger and the secondary heat exchanger comprising a multitude of tubular flow passageways configured to further vaporize liquid droplets remaining in the gas after passing through the primary heat exchanger; and wherein the tubular flow passageways in either the primary heat exchanger or the secondary heat exchanger direct the gas/vapor mixture along a tortuous flow path wherein the flow path comprises at least one change in a direction of flow between the inlet and outlet of the primary heat exchanger or the secondary heat exchanger.