发明名称 METHOD OF LASER SCRIBING OF SEMICONDUCTOR WORKPIECE USING DIVIDED LASER BEAMS
摘要 This invention provides an effective and rapid method of laser processing for separating semiconductor devices formed on hard and solid substrates (6) with a one pass process. The method is based on generating fractures along the scribing trajectory which extend deep into the bulk of a workpiece (6), wherein thermal stress is induced by delivering at least two processing (ultra short pulse) pulsed-beams (7), containing at least primary and secondary pulses. Primary pulses are used to generate a heat accumulated zone, which allows for more efficient absorption of the secondary pulses, which generate a sufficient heat gradient to produce mechanical failures, necessary for mechanically separating the workpiece (6) into separate pieces.
申请公布号 WO2016193786(A1) 申请公布日期 2016.12.08
申请号 WO2015IB54143 申请日期 2015.06.01
申请人 EVANA TECHNOLOGIES, UAB 发明人 VANAGAS, Egidijus;KIMBARAS, Dziugas;VESELIS, Laurynas
分类号 B23K26/067;B23K26/0622;B23K26/364;B23K101/40;B23K103/16 主分类号 B23K26/067
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