| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemical amplification-type positive resist composition having high sensitivity and high resolution, suppressing generation of standing waves and giving a rectangular profile even when a high-reflection substrate is used as it is without applying an antireflection film, and to provide a pattern forming method using the composition. <P>SOLUTION: The positive resist composition includes: a resin containing a repeating unit having a group expressed by -CH<SB>2</SB>-Y-Z<SP>1</SP>on a benzene ring, of which solubility in an alkali developer increases under an action of an acid; and a compound capable of generating an acid upon irradiation with actinic rays or radiation. In the above formula, Y represents a single bond or a bivalent linking group and Z<SP>1</SP>represents a non-acid decomposable group. The pattern forming method uses the positive resist composition. <P>COPYRIGHT: (C)2009,JPO&INPIT |
