发明名称 MULTIPLE WAVELENGTH X-RAY SOURCE
摘要 A multiple wavelength x-ray source (10) includes a multi-thickness target (14, 14b, 14c, 14d), having at least a first and a second thickness (T2, Tl). The first thickness can substantially circumscribe the second thickness. An electron beam (21) can be narrowed to impinge primarily upon second thickness or expanded to impinge primarily upon the first thickness while maintaining a constant direction of the beam. This invention allows the target thickness to be optimized for the desired output wavelength without the need to redirect or realign the x-rays towards the target.
申请公布号 WO2011084232(A2) 申请公布日期 2011.07.14
申请号 WO2010US56011 申请日期 2010.11.09
申请人 MOXTEK, INC.;KOZACZEK, KRZYSZTOF;CORNABY, STERLING;LIDDIARD, STEVEN;JENSEN, CHARLES 发明人 KOZACZEK, KRZYSZTOF;CORNABY, STERLING;LIDDIARD, STEVEN;JENSEN, CHARLES
分类号 H01J35/08 主分类号 H01J35/08
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