| 摘要 |
To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1):
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒCF 2 =CFCH 2 CH-Q-CH 2 CH=CH 2 €ƒ€ƒ€ƒ€ƒ€ƒ(1)
wherein Q is (CH 2 ) a C(CF 3 ) 2 OR 4 (wherein a is an integer of from 0 to 3, R 4 is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH 2 R 5 (wherein R 5 is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH2) d COOR 6 (wherein d is 0 or 1, and R 6 is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base. |
