发明名称 Localized anodic thinning
摘要 A protective mask and a method of localized anodic thinning to prevent excessive thinning of an epitaxial layer in the forming of a field effect transistor. A moat exposing the epitaxial layer is provided in the protective mask surrounding a device pattern or group of patterns to be formed in the epitaxial layer by anodic thinning. During the thinning process, the area of the epitaxial layer exposed by the moat becomes fully depleted and cuts off current into the region surrounded by the moat and prevents excessive thinning of the epitaxial layer under the design pattern.
申请公布号 US4248683(A) 申请公布日期 1981.02.03
申请号 US19800142794 申请日期 1980.04.22
申请人 THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY 发明人 SHAW, DON W.
分类号 C25F3/12;C25F3/14;H01L21/306;H01L21/308;(IPC1-7):C25F3/12 主分类号 C25F3/12
代理机构 代理人
主权项
地址