发明名称 Method for depositing a layer on the inside of cavities of a work piece
摘要 Disclosed herein is a process for the chemical deposition of a material layer on the inside of cavities of a work piece by conducting a gas stream in a substantially laminar flow along a heated work piece wherein deposition occurs from the gaseous phase, at a pressure of less than 104 Pascal (N/m2).
申请公布号 US4294871(A) 申请公布日期 1981.10.13
申请号 US19790071685 申请日期 1979.08.29
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 HIEBER, KONRAD;STOLZ, MANFRED
分类号 C23C16/04;C23C16/44;C23C16/455;(IPC1-7):C23C11/00 主分类号 C23C16/04
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