发明名称 |
Method for depositing a layer on the inside of cavities of a work piece |
摘要 |
Disclosed herein is a process for the chemical deposition of a material layer on the inside of cavities of a work piece by conducting a gas stream in a substantially laminar flow along a heated work piece wherein deposition occurs from the gaseous phase, at a pressure of less than 104 Pascal (N/m2).
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申请公布号 |
US4294871(A) |
申请公布日期 |
1981.10.13 |
申请号 |
US19790071685 |
申请日期 |
1979.08.29 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
HIEBER, KONRAD;STOLZ, MANFRED |
分类号 |
C23C16/04;C23C16/44;C23C16/455;(IPC1-7):C23C11/00 |
主分类号 |
C23C16/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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