| 摘要 |
PURPOSE:To improve the utilization efficiency of a target and to prolong the life of the target, by providing plural pieces of electromagnets thereby making magnetic field distribution variable and forming the flat magnetic field distribution. CONSTITUTION:A sputtering electrode of a planar magnetron system consisting of means of means for generating magnetism, the 1st electrode, the 2nd electrode, and means for supplying electric power for the 1st and the 2nd electrodes. The above-described means for generating magnetism are formed of means for generating magnetism wherein the 1st means 22 for generating main magnetism, and the 2nd means for controlling magnetic flux distributions are formed on one body, and the 3rd means 24 for generating magnetism, and forms magnetic fields between a sample substrate 10 and a target flat plage 4. The 3rd means 24 is provided so as to generate the magnetic field distributions perpendicular to the 1st main plane of the plate 4. The magnetic flux densities of the means 23 and the means 24 are controlled, whereby the magnetic flux density and distribution to be formed on the 1st main plane of the plate 4 are controlled. |
