| 摘要 |
PURPOSE:To obtain a pattern high in resolution by forming a dry film resist made of a photopolymerizable resin prepared from methacrylic acid. CONSTITUTION:The usable photopolymn. initiators are such as benzoin alkyl ethers, acetophenones, benzyl ketals, anthraquinones, and thioxantones. They are used alone or in combination, preferably, in an amt. of 0.1-2wt% of the total solid the compsn. The dry film resist is formed by coating a support with the compsn., and evaporating a solvent when it is used. The support mainly used is a plastic film, such as a polyester film. As a result, the obtained resist is superior in storage stability, easiness of operation, and process passing performance as etching and plating resists, and a pattern of high resolution can be obtained.
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