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发明名称
Method of manufacturing a semiconductor device
摘要
A method of manufacturing a semiconductor device which comprises the step of applying a silicon carbide film having a prescribed perforated pattern as a masking film selectively to etch a silicon dioxide film or diffuse an impurity into a substrate.
申请公布号
US4560642(A)
申请公布日期
1985.12.24
申请号
US19840632239
申请日期
1984.07.19
申请人
TOYKO SHIBAURA ELECTRIC CO
发明人
YONEZAWA, TOSHIO;AJIMA, TAKASHI;HIRAKI, SHUNICHI;KOSHINO, YUTAKA;OKA, YOSHITAMI
分类号
H01L21/033;H01L21/311;H01L21/314;(IPC1-7):B05D1/32
主分类号
H01L21/033
代理机构
代理人
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