发明名称 MOLECULAR BEAM EPITAXIAL DEVICE
摘要 PURPOSE:To carry out directly pressure control of space, and to form a high- quality epitaxial film, by setting a cooling means corresponding to radiation space of molecular beam between a molecular beam source and an epitaxial film-forming face. CONSTITUTION:The molecular beam source 30 is heated, molecular beam starts to radiate from the molecular beam source 30 towards the molecular beam radiation space 50, and formation of an epitaxial film of the test specimen 70 starts. When molecular beam radiation from the molecular beam source 30 starts in this way, the pressure of the space 50 corresponding to the epitaxial film-forming face of the test specimen 70 begins to rise. Then, a refrigerant is fed from a refrigerant feed source through the pope 61 to the cooling means 60. The lower the temperature of the refrigerant, the higher exhaust effect, and the pressure control of the molecular beam space 50 can be carried out directly by selecting the refrigerant to be fed to the cooling means 60 and by controlling a feed amount of it.
申请公布号 JPS61111993(A) 申请公布日期 1986.05.30
申请号 JP19840233131 申请日期 1984.11.07
申请人 HITACHI LTD 发明人 OKUNO SUMIO;TERASAKI MASAO;UCHIMAKI YOICHI
分类号 C30B23/08;C30B23/06;H01L21/203 主分类号 C30B23/08
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